Quartz Tube Semiconductor Grade Clear Fused Silica For Diffusion Furnace Wafer Process Vacuum Sealing Laboratory Custom Size
Ürün Detayları
| Yoğunluk: | 2.2g/cm3 | Erime Noktası: | 1750-1850 ℃ |
|---|---|---|---|
| Tavlama noktası: | 1180 ℃ | Malzeme: | SIO2>% 99.99 |
| Gerinim noktası: | 1100°C | Sertlik: | Morse 6.5 |
Ürün Açıklaması
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Herhangi bir sorunuz varsa lütfen aşağıdaki çevrimiçi talep iletişim formumuzu kullanın, ekibimiz en kısa sürede size geri dönüş yapacaktır.
